Chinese translation for "ion etching"

离子刻蚀
离子蚀刻法

Related Translations:

etched:  刺耳蚀刻蚀像

etching ink:  腐蚀墨水耐酸漆

etch plain:  刻蚀平原

color etching:  着色腐蚀

etching knife:  蚀刻刀

sideways etch:  侧向腐蚀

etching pattern:  侵蚀图侵蚀形态蚀刻模式

mask etch:  掩蔽腐蚀, 掩模刻蚀

secco etching:  射哥蚀刻

sirtl etching:  沙特蚀刻

Example Sentences:

	1.	Narrow gap reactive ion etching system 狭窄间隙反应性离子蚀刻系统
	2.	Reactive ion etching system rie system 反应性离子蚀刻系统
	3.	The theory of ion etching and the parameter of ion source designing are discussed in detail 并且详细介绍了离子刻蚀和离子源的原理。
	4.	The reactor is capable of working in the rie ( reactive ion etching ) mode and also in the plasma etching mode 反应腔拥有在rie (反应离子刻蚀)模式和等离子刻蚀模式下工作的能力。
	5.	The submicron ring , laser beam shaper and fresnel lens is fabricated by ion etching according to the selected parameter 依照这些参数刻蚀出了高质量的特征尺寸为亚微米的环、光束整形元件和菲涅耳透镜等元件。
	6.	Yak hairs were treated by the microwave electron cyclotron resonance plasma reactive ion etching ( ecr - rie ) equipment to improve its property of weave 摘要采用微波电子回旋共振等离子体反应离子刻蚀( ecr - rie )装置对牦牛毛纤维进行表面改性，从而改善牦牛毛的可纺性。
	7.	Kionix manufactures inertial sensors using plasma micromachining , a highly - refined , proprietary , deep reactive ion etch drie fabrication technology . the resulting products are ultra - small mechanical elements integrated with electronics to create microelectromechanical systems mems Kionix的惯性sensor采用的plasma微机电制程,是一种经高度改良且有独家专利制程,使产品的机械结构部份做到最小并同时与电子电路结合形成一先进的微机电产品
	8.	By studying and using conventional 1c process in combination with electron beam lithography ( ebl ) , reactive ion etching ( rie ) and lift - off process , several efficient results are produced : semiconductor and metal nano - structures are fabricated ; the matching problem of photolithography and electron beam lithography is well solved ; the process efficiency is improved ; the process is offered for the controlled fabrication of nano - structures by repetitious process testing ; several nano - structures such as si quantum wires , si quantum dots , double quantum dot structures and tri - wire metal gate are firstly fabricated by using ebl and rie processes 研究利用常规的硅集成电路工艺技术结合电子束光刻，反应离子刻蚀和剥离等技术制备半导体和金属纳米结构，很好地解决了普通光刻与电子束光刻的匹配问题，提高了加工效率，经过多次的工艺实验，摸索出一套制备纳米结构的工艺方法，首次用电子束光刻，反应离子刻蚀和剥离等技术制备出了多种纳米结构(硅量子线、量子点，双量子点和三叉指状的金属栅结构) 。
	9.	We give some useful analyses and the computer simulations for the ion etching process . compared with the atomic force microscope ( afm ) scanning photograph of the etching surface , the theoretical results prove that these simulation analyses assure the precision required by this problem , so these mathematical models are reasonable and correct . the analysis method in this paper is useful to analyze etching process , and it can also afford some valuable reference to etching technology 在本论文我们主要利用这个数学模型，对使用离子束刻蚀制作单台阶光栅的台阶与沟槽部分的表面面形随时间的演变过程分别进行了计算机模拟分析，并通过把理论结果与在实验中得到的刻蚀表面在原子力显微镜（ afm ）下拍摄的照片进行比较，结果说明这种模拟分析能够保证对该问题分析所要求的精度，从而也证明了理论模型的合理性和正确性。
	10.	In the section of fabricating technology , i first discuss the ion beam technology . through the analysis of the effects of each parameter on the surface smoothness , profile fidelity and linewidth resolution in the process of ion etching , the suitable angle of incident ion beam , ion energy , density of ion beam and time of etching are selected combining the actual status of the mask 在制作工艺的研究方面，首先研究了离子束刻蚀技术，通过对离子束刻蚀过程中各个参数对刻蚀元件的表面光洁度、轮廓保真度和线宽分辨的影响分析，结合掩膜的实际情况选择出了合适的离子束入射角、离子能量、束流密度和刻蚀时间等参数。

Similar Words：

"ion equilibrium" Chinese translation, "ion erice" Chinese translation, "ion erosion" Chinese translation, "ion escape" Chinese translation, "ion estimation" Chinese translation, "ion etching chamber" Chinese translation, "ion etching equipment" Chinese translation, "ion etching machine" Chinese translation, "ion etching station" Chinese translation, "ion evaporation" Chinese translation